We are delighted to announce the acquisition of two advanced CNC machines from DMG Mori. These state-of-the-art machines represent a significant investment in our commitment to delivering unparalleled precision, repeatability, and efficiency in our production processes.
Photoemission spectroscopy is a powerful experimental technique used to study the elemental and electronic structure of materials in various states such as solids, liquids and gases. The application covers a wide range of scientific fields, with the main focus on surface chemistry and materials science. The most common forms of photoemission spectroscopy (PES) are X-ray photoelectron spectroscopy (XPS), Ultra-Violet photoelectron spectroscopy (UPS) and Angle Resolved photoelectron spectroscopy (ARPES). Let’s explore some of the fundamental aspects of this powerful tool.
Mu-metal is a type of magnetic shielding material that is often used in electron spectroscopy chambers to minimise external magnetic interference. Electron spectroscopy techniques, such as X-ray photoelectron spectroscopy (XPS) or Auger electron spectroscopy (AES), are highly sensitive to magnetic fields. External magnetic fields can distort the trajectories of electrons, leading to inaccuracies in the measurements and affecting the overall performance of the spectroscopy system.
The semiconductor industry relies heavily on vacuum technology for various processes and applications. Vacuum, in this context, refers to an environment with very low pressure and a near absence of gas molecules. Here are some key ways in which vacuum technology is used in the semiconductor industry:
