Material Science

Molecular Beam Epitaxy (MBE) is a highly precise technique for growing thin films, widely used in semiconductor fabrication, nanotechnology, and material science research. One of the most crucial elements of the MBE process is the quality of the vacuum environment in which it takes place.

MBE requires an ultra-high vacuum (UHV) chamber, where the pressure is kept extremely low, typically around 10⁻¹⁰ torr. The ability to maintain such a pristine environment is vital to achieving high-quality film growth and ensuring material purity. In this blog, we’ll explore why vacuum quality is so essential in MBE systems and how it directly impacts the success of the process.

Extreme high vacuum (XHV) environments are becoming a popular option for a range of applications i.e. Molecular Beam Epitaxy (MBE). Given the extreme situations required for XHV, there are a variety of issues that coincide with this. One persistent issue is the removal of hydrogen gas.

Material analysis is a foundation of scientific research and industrial applications, providing critical insights into the composition, structure, and properties of materials. Among the array of techniques available, Secondary Ion Mass Spectrometry (SIMS) stands out for its exceptional sensitivity and depth profiling capabilities.

Synchrotron science shines across disciplines, illuminating a pathway for scientific discoveries. Synchrotrons use synchrotron radiation, which is produced when charged particles, typically electrons, are accelerated to nearly the speed of light in a circular or spiral path by strong magnetic fields. This process generates intense beams of light that cover a broad spectrum, from infrared to X-rays.

Introduction

Material deposition refers to the process of adding or depositing material onto a substrate or surface. This can be achieved through various techniques and methods, each suited to different applications. For many of these applications, vacuum is an essential requirement to achieve the required quality.

Introduction

Photoemission spectroscopy is a powerful experimental technique used to study the elemental and electronic structure of materials in various states such as solids, liquids and gases. The application covers a wide range of scientific fields, with the main focus on surface chemistry and materials science. The most common forms of photoemission spectroscopy (PES) are X-ray photoelectron spectroscopy (XPS), Ultra-Violet photoelectron spectroscopy (UPS) and Angle Resolved photoelectron spectroscopy (ARPES). Let’s explore some of the fundamental aspects of this powerful tool.

Introduction

A Nickel-Iron Alloy is a type of magnetic shielding material that is often used in electron spectroscopy chambers to minimise external magnetic interference. Electron spectroscopy techniques, such as X-ray photoelectron spectroscopy (XPS) or Auger electron spectroscopy (AES), are highly sensitive to magnetic fields. External magnetic fields can distort the trajectories of electrons, leading to inaccuracies in the measurements and affecting the overall performance of the spectroscopy system.

Introduction

Material science is a crossover of disciplines having roots in Physics, Chemistry and Engineering. Covering all three, UHV Manipulation is becoming ever more important in ensuring micro-precision in both surface analysis and deposition.

VACGEN’s ultra-high vacuum chambers are used throughout research and industry, with each sector leveraging advanced builds and technology to suit their unique needs.

There are countless vacuum chamber builds available and, if you partner with VACGEN, you can benefit from a bespoke project that’s tailored to your exact needs – no matter how advanced the application.